Nanoimprint Lithography (NIL)
IQE has added Nanoimprint Lithography (NIL) to its technology portfolio as a non-epitaxial, value-add technique that complements its core materials expertise.
NIL is a method for wafer patterning with the ability to routinely achieve feature sizes down to <50 nm, dimensions typically reserved for electron beam lithography (EBL). Unlike EBL, NIL is a high throughput process and therefore significantly less expensive than EBL for volume applications. IQE has employed its NIL technology to create a turnkey DFB product offering for both 10G and 25G devices.